AT284365B - Device for coating objects - Google Patents

Device for coating objects

Info

Publication number
AT284365B
AT284365B AT877167A AT877167A AT284365B AT 284365 B AT284365 B AT 284365B AT 877167 A AT877167 A AT 877167A AT 877167 A AT877167 A AT 877167A AT 284365 B AT284365 B AT 284365B
Authority
AT
Austria
Prior art keywords
coating objects
objects
coating
Prior art date
Application number
AT877167A
Other languages
German (de)
Inventor
Pierre Ing Gallez
Original Assignee
Glaverbel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Glaverbel filed Critical Glaverbel
Application granted granted Critical
Publication of AT284365B publication Critical patent/AT284365B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
AT877167A 1966-10-05 1967-09-27 Device for coating objects AT284365B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LU52106A LU52106A1 (en) 1966-10-05 1966-10-05

Publications (1)

Publication Number Publication Date
AT284365B true AT284365B (en) 1970-09-10

Family

ID=19724990

Family Applications (2)

Application Number Title Priority Date Filing Date
AT874467A AT280514B (en) 1966-10-05 1967-09-26 Device for the formation of at least two different, superimposed thin coating layers
AT877167A AT284365B (en) 1966-10-05 1967-09-27 Device for coating objects

Family Applications Before (1)

Application Number Title Priority Date Filing Date
AT874467A AT280514B (en) 1966-10-05 1967-09-26 Device for the formation of at least two different, superimposed thin coating layers

Country Status (11)

Country Link
US (1) US3616451A (en)
AT (2) AT280514B (en)
BE (1) BE704031A (en)
CH (1) CH501063A (en)
DE (1) DE1615287A1 (en)
ES (1) ES345149A1 (en)
FI (1) FI46636C (en)
FR (1) FR1556228A (en)
GB (1) GB1194428A (en)
LU (1) LU52106A1 (en)
NL (1) NL6713182A (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3767559A (en) * 1970-06-24 1973-10-23 Eastman Kodak Co Sputtering apparatus with accordion pleated anode means
FR2098563A5 (en) * 1970-07-10 1972-03-10 Progil
JPH0733576B2 (en) * 1989-11-29 1995-04-12 株式会社日立製作所 Sputter device, target exchanging device, and exchanging method thereof
JPH05804A (en) * 1990-08-01 1993-01-08 Sumitomo Electric Ind Ltd Large area complex oxide superconducting thin film deposition system
US5292419A (en) * 1990-12-20 1994-03-08 Leybold Aktiengesellschaft Sputtering unit
DE4040856A1 (en) 1990-12-20 1992-06-25 Leybold Ag SPRAYING SYSTEM
US5322606A (en) * 1991-12-26 1994-06-21 Xerox Corporation Use of rotary solenoid as a shutter actuator on a rotating arm
US5279724A (en) * 1991-12-26 1994-01-18 Xerox Corporation Dual sputtering source
GB9405442D0 (en) * 1994-03-19 1994-05-04 Applied Vision Ltd Apparatus for coating substrates
US6045671A (en) * 1994-10-18 2000-04-04 Symyx Technologies, Inc. Systems and methods for the combinatorial synthesis of novel materials
DE19830223C1 (en) * 1998-07-07 1999-11-04 Techno Coat Oberflaechentechni Magnetron sputtering unit for multilayer coating of substrates especially in small to medium runs or in laboratories
US6833031B2 (en) * 2000-03-21 2004-12-21 Wavezero, Inc. Method and device for coating a substrate
JP2003141719A (en) * 2001-10-30 2003-05-16 Anelva Corp Sputtering device and thin film forming method
JP4066044B2 (en) * 2002-11-08 2008-03-26 信行 高橋 Film forming method and sputtering apparatus
CA2564539C (en) * 2005-11-14 2014-05-06 Sulzer Metco Coatings B.V. A method for coating of a base body with a platinum modified aluminide ptmal by means of a physical deposition out of the gas phase
US8287647B2 (en) * 2007-04-17 2012-10-16 Lam Research Corporation Apparatus and method for atomic layer deposition
KR100865475B1 (en) * 2007-08-30 2008-10-27 세메스 주식회사 Nozzle assembly, processing liquid supply apparatus having the same, and processing liquid supply method using the same
US10586689B2 (en) 2009-07-31 2020-03-10 Guardian Europe S.A.R.L. Sputtering apparatus including cathode with rotatable targets, and related methods
WO2012015744A1 (en) * 2010-07-28 2012-02-02 Synos Technology, Inc. Rotating reactor assembly for depositing film on substrate
US20130014700A1 (en) * 2011-07-11 2013-01-17 Hariharakeshava Sarpangala Hegde Target shield designs in multi-target deposition system.
CN105793976A (en) * 2013-10-24 2016-07-20 梅耶博格（德国）股份有限公司 Multi-magnet arrangement
WO2019010387A1 (en) * 2017-07-07 2019-01-10 Nextracker Inc. Systems for and methods of positioning solar panels in an array of solar panels to efficiently capture sunlight

Also Published As

Publication number Publication date
US3616451A (en) 1971-10-26
NL6713182A (en) 1968-04-08
FI46636C (en) 1973-05-08
LU52106A1 (en) 1968-05-07
AT280514B (en) 1970-04-10
CH501063A (en) 1970-12-31
ES345149A1 (en) 1968-11-16
FR1556228A (en) 1969-02-07
GB1194428A (en) 1970-06-10
BE704031A (en) 1968-03-19
DE1615287A1 (en) 1970-06-11
FI46636B (en) 1973-01-31

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee