NL185425B - METHOD FOR FORMING AN IMAGE ALONG DRY ROAD. - Google Patents

METHOD FOR FORMING AN IMAGE ALONG DRY ROAD.

Info

Publication number
NL185425B
NL185425B NLAANVRAGE7704083,A NL7704083A NL185425B NL 185425 B NL185425 B NL 185425B NL 7704083 A NL7704083 A NL 7704083A NL 185425 B NL185425 B NL 185425B
Authority
NL
Netherlands
Prior art keywords
forming
image along
dry road
along dry
road
Prior art date
Application number
NLAANVRAGE7704083,A
Other languages
Dutch (nl)
Other versions
NL7704083A (en
NL185425C (en
Original Assignee
Kimoto Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Kk filed Critical Kimoto Kk
Publication of NL7704083A publication Critical patent/NL7704083A/en
Publication of NL185425B publication Critical patent/NL185425B/en
Application granted granted Critical
Publication of NL185425C publication Critical patent/NL185425C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
    • H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
NLAANVRAGE7704083,A 1976-04-14 1977-04-14 METHOD FOR FORMING AN IMAGE ALONG DRY ROAD. NL185425C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4208376A JPS52126220A (en) 1976-04-14 1976-04-14 Dry image forming material and method of forming image

Publications (3)

Publication Number Publication Date
NL7704083A NL7704083A (en) 1977-10-18
NL185425B true NL185425B (en) 1989-11-01
NL185425C NL185425C (en) 1990-04-02

Family

ID=12626139

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7704083,A NL185425C (en) 1976-04-14 1977-04-14 METHOD FOR FORMING AN IMAGE ALONG DRY ROAD.

Country Status (12)

Country Link
JP (1) JPS52126220A (en)
BE (1) BE853618A (en)
CA (1) CA1094377A (en)
CH (1) CH628160A5 (en)
DD (1) DD130507A5 (en)
DE (1) DE2716422C2 (en)
FR (1) FR2371706A1 (en)
GB (1) GB1563010A (en)
IT (1) IT1094789B (en)
NL (1) NL185425C (en)
SE (1) SE435214B (en)
SU (1) SU948301A3 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5479027A (en) * 1977-12-05 1979-06-23 Kimoto Kk Dry picture forming material
JPS54179986U (en) * 1978-06-07 1979-12-19
EP0042632A1 (en) * 1980-06-20 1981-12-30 Agfa-Gevaert N.V. Recording material and method for the production of metal images
JPS5858546A (en) * 1981-10-02 1983-04-07 Kimoto & Co Ltd Photosensitive mask material for photoengraving
JPS59198445A (en) * 1983-04-27 1984-11-10 Kimoto & Co Ltd Image forming material by stripping
JPS60238826A (en) * 1984-05-14 1985-11-27 Kimoto & Co Ltd Image forming material
JPS61243603A (en) * 1985-04-19 1986-10-29 岡村　一 Candle stand
DE69524589D1 (en) * 1995-08-08 2002-01-24 Agfa Gevaert Nv Process for forming metallic images
EP0762214A1 (en) * 1995-09-05 1997-03-12 Agfa-Gevaert N.V. Photosensitive element comprising an image forming layer and a photopolymerisable layer
JP2001284350A (en) * 2000-03-31 2001-10-12 Nitto Denko Corp Pattern-forming method and adhesive sheet for peeling off thin film
JP2009032912A (en) * 2007-07-27 2009-02-12 Sony Corp Method of manufacturing semiconductor device, and method of manufacturing organic light-emitting device
US10349525B2 (en) 2013-10-30 2019-07-09 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Substrate comprising an electrical circuit pattern, method and system for providing same

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2999016A (en) * 1955-03-24 1961-09-05 Keuffel & Esser Co Drawing material
BE623972A (en) * 1961-10-23
DE1447012B2 (en) * 1963-07-20 1972-12-21 Kalle Ag, 6202 Wiesbaden-Biebrich NEGATIVE WORKING, SENSITIZED COPPER-ALUMINUM BIMETAL PLATE
DE1572153B2 (en) * 1966-06-27 1971-07-22 E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) PHOTOPOLYMERIZABLE RECORDING MATERIAL
DE1597644C3 (en) * 1966-11-03 1973-09-20 Teeg Research Inc., Detroit, Mich. (V.St.A.) Process for the production of deer images
DE1671625A1 (en) * 1967-01-24 1971-09-16 Kalle Ag Composite material for the production of multi-metal printing forms
ZA711869B (en) * 1970-05-27 1971-12-29 Gen Electric Aqueous electrocoating solutions and method of making and using same
JPS4837643A (en) * 1971-09-15 1973-06-02
JPS5821257B2 (en) * 1974-04-25 1983-04-28 富士写真フイルム株式会社 Red-spotted moth
JPS516530A (en) * 1974-07-04 1976-01-20 Toray Industries GAZOKEISEIZ AIRYO

Also Published As

Publication number Publication date
AU1946676A (en) 1978-06-29
BE853618A (en) 1977-08-01
NL7704083A (en) 1977-10-18
FR2371706B1 (en) 1980-04-25
SU948301A3 (en) 1982-07-30
GB1563010A (en) 1980-03-19
DD130507A5 (en) 1978-04-05
JPS5613305B2 (en) 1981-03-27
DE2716422A1 (en) 1977-11-03
JPS52126220A (en) 1977-10-22
SE435214B (en) 1984-09-10
CA1094377A (en) 1981-01-27
FR2371706A1 (en) 1978-06-16
IT1094789B (en) 1985-08-02
CH628160A5 (en) 1982-02-15
DE2716422C2 (en) 1987-10-01
NL185425C (en) 1990-04-02

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Legal Events

Date Code Title Description
BC A request for examination has been filed
A85 Still pending on 85-01-01
BK Erratum

Free format text: CORRECTION TO PAMPHLET

V1 Lapsed because of non-payment of the annual fee