NL191765C - Method for etching a figure into a three-dimensional workpiece. - Google Patents

Method for etching a figure into a three-dimensional workpiece.

Info

Publication number
NL191765C
NL191765C NL8300823A NL8300823A NL191765C NL 191765 C NL191765 C NL 191765C NL 8300823 A NL8300823 A NL 8300823A NL 8300823 A NL8300823 A NL 8300823A NL 191765 C NL191765 C NL 191765C
Authority
NL
Netherlands
Prior art keywords
etching
dimensional workpiece
workpiece
dimensional
Prior art date
Application number
NL8300823A
Other languages
Dutch (nl)
Other versions
NL191765B (en
NL8300823A (en
Original Assignee
Ultra Centrifuge Nederland Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ultra Centrifuge Nederland Nv filed Critical Ultra Centrifuge Nederland Nv
Priority to NL8300823A priority Critical patent/NL191765C/en
Publication of NL8300823A publication Critical patent/NL8300823A/en
Publication of NL191765B publication Critical patent/NL191765B/en
Application granted granted Critical
Publication of NL191765C publication Critical patent/NL191765C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
NL8300823A 1983-03-07 1983-03-07 Method for etching a figure into a three-dimensional workpiece. NL191765C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
NL8300823A NL191765C (en) 1983-03-07 1983-03-07 Method for etching a figure into a three-dimensional workpiece.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8300823 1983-03-07
NL8300823A NL191765C (en) 1983-03-07 1983-03-07 Method for etching a figure into a three-dimensional workpiece.

Publications (3)

Publication Number Publication Date
NL8300823A NL8300823A (en) 1984-04-02
NL191765B NL191765B (en) 1996-03-01
NL191765C true NL191765C (en) 1996-07-02

Family

ID=19841513

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8300823A NL191765C (en) 1983-03-07 1983-03-07 Method for etching a figure into a three-dimensional workpiece.

Country Status (1)

Country Link
NL (1) NL191765C (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3113896A (en) * 1961-01-31 1963-12-10 Space Technology Lab Inc Electron beam masking for etching electrical circuits
DE1621480A1 (en) * 1967-04-29 1971-04-29 Licentia Gmbh Process for the production of AEtz templates for copper-clad components, such as circuit boards or the like.
GB1202617A (en) * 1967-12-22 1970-08-19 Gerber Scientific Instr Co Improvements in or relating to scanning devices for exposing photosensitive surfaces
DE1772648A1 (en) * 1968-06-14 1971-05-27 Siemens Ag Method of manufacturing a mask for semiconductor use
US4003061A (en) * 1975-10-31 1977-01-11 Applicon Incorporated Photoplotter

Also Published As

Publication number Publication date
NL191765B (en) 1996-03-01
NL8300823A (en) 1984-04-02

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Legal Events

Date Code Title Description
A1B A search report has been drawn up
A85 Still pending on 85-01-01
BC A request for examination has been filed
V2 Lapsed due to non-payment of the last due maintenance fee for the patent application

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