CN107746186B - High-hardness wear-resistant glass cover plate and preparation method thereof - Google Patents

High-hardness wear-resistant glass cover plate and preparation method thereof Download PDF

Info

Publication number
CN107746186B
CN107746186B CN201710963120.5A CN201710963120A CN107746186B CN 107746186 B CN107746186 B CN 107746186B CN 201710963120 A CN201710963120 A CN 201710963120A CN 107746186 B CN107746186 B CN 107746186B
Authority
CN
China
Prior art keywords
coating
layer
cover plate
mtorr
glass cover
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201710963120.5A
Other languages
Chinese (zh)
Other versions
CN107746186A (en
Inventor
陈立
吴德生
朱得菊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Truly Opto Electronics Ltd
Original Assignee
Truly Opto Electronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Truly Opto Electronics Ltd filed Critical Truly Opto Electronics Ltd
Priority to CN201710963120.5A priority Critical patent/CN107746186B/en
Publication of CN107746186A publication Critical patent/CN107746186A/en
Application granted granted Critical
Publication of CN107746186B publication Critical patent/CN107746186B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/28—Other inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/29—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Hair brushThe high-hardness wear-resistant glass cover plate comprises a glass substrate and SiO which are contacted in sequence2A layer, a hydrogen-containing DLC layer, and a Si-doped DLC layer; the atomic percentage of Si in the Si-doped DLC layer is 8-14%. The invention designs a novel double-layer diamond-like carbon film structure by combining the characteristics of hydrogen-containing diamond-like carbon, and improves the hardness and the friction resistance of the film and reduces the dynamic friction coefficient of the film by doping Si with proper content in the DLC layer under the condition of ensuring high optical transmittance. The invention also provides a preparation method of the high-hardness wear-resistant glass cover plate, and the invention sequentially coats films on the surface of the glass cover plate substrate by a magnetron sputtering method, so that the films are tightly combined together, and the friction resistance of the product is further improved.

Description

High-hardness wear-resistant glass cover plate and preparation method thereof
Technical Field
The invention belongs to the technical field of films, and particularly relates to a high-hardness wear-resistant glass cover plate and a preparation method thereof.
Background
The existing glass cover plate has a plurality of coating films, such as an antireflection film (AR), an antireflection film, an anti-glare film (AG) and various decorative color films, according to optical requirements, wherein the coating films are all used for meeting certain optical requirements, but the coating films have the advantages of low hardness, low scratch resistance, large surface roughness and poor use hand feeling. Meanwhile, the glass is easier to scratch due to lower hardness of the glass.
Disclosure of Invention
The glass cover plate has high hardness and strong anti-scratching capability, and meanwhile, the dynamic friction coefficient of the surface of the film layer is low, the smoothness is high, and the use hand feeling is better.
The invention provides a high-hardness wear-resistant glass cover plate which comprises a glass substrate and SiO which are sequentially contacted2A layer, a hydrogen-containing DLC layer, and a Si-doped DLC layer;
the atomic percentage of Si in the Si-doped DLC layer is 8-14%.
Preferably, the SiO2The thickness of the layer is 2 to 20 nm.
Preferably, the thickness of the hydrogen-containing DLC layer is 3-20 nm.
Preferably, the thickness of the Si-doped DLC layer is 3-20 nm.
The invention provides a preparation method of a high-hardness wear-resistant glass cover plate, which comprises the following steps:
A) si is taken as a target material, Ar gas and O are introduced2Carrying out magnetron sputtering on the glass substrate under the vacuum condition to obtain the SiO-plated glass substrate2A glass substrate of the layer;
B) graphite is used as a target material, Ar gas and H are introduced2Plating SiO under vacuum condition2Carrying out magnetron sputtering on the glass of the layer to obtain a glass substrate plated with a hydrogen-containing DLC layer;
C) si-graphite is taken as a composite target material, Ar gas and H are introduced2And carrying out magnetron sputtering on the glass substrate plated with the hydrogen-containing DLC layer under a vacuum condition to obtain the high-hardness wear-resistant glass cover plate.
Preferably, the vacuum degree in the step A) is (3.0-6.0) E-6 mTorr;
the flow rate of Ar gas is 35-100 sccm; o is2The flow rate of (2) is 8 to 50 sccm.
Preferably, the coating air pressure of the magnetron sputtering in the step A) is 3.0-9.0 mTorr;
the coating voltage of the magnetron sputtering is 300-460V;
the coating time of the magnetron sputtering is 15-60 s;
the power of the Si target is 0.8-2.0 kW.
Preferably, the vacuum degree in the step B) is (3.0-6.0) E-6 mTorr;
the flow rate of Ar gas is 25-45 sccm; h2The flow rate of (2) is 10 to 30 sccm.
Preferably, the coating air pressure of the magnetron sputtering in the step B) is 3.0-6.0 mTorr;
the coating voltage of the magnetron sputtering is 600-800V;
the coating time of the magnetron sputtering is 15-50 s;
the power of the C target is 5.0-8.0 kW.
Preferably, in the step C), the vacuum degree is (3.0-6.0) E-6 mTorr;
the flow rate of Ar gas is 25-45 sccm; h2The flow rate of (2) is 10-30 sccm;
the coating air pressure of the magnetron sputtering is 3.0-6.0 mTorr;
the coating voltage of the magnetron sputtering is 600-800V;
the coating time of the magnetron sputtering is 15-50 s;
the power of the Si-graphite target is 4.5-8.0 kW.
The invention provides a high-hardness wear-resistant glass cover plate which comprises a glass substrate and SiO which are sequentially contacted2A layer, a hydrogen-containing DLC layer, and a Si-doped DLC layer; the atomic percentage of Si in the Si-doped DLC layer is 8-14%. The invention designs a novel double-layer diamond-like carbon film structure by combining the characteristics of hydrogen-containing diamond-like carbon, and improves the hardness and the friction resistance of the film and reduces the dynamic friction coefficient of the film by doping Si with proper content in the DLC layer under the condition of ensuring high optical transmittance.
The invention also provides a preparation method of the high-hardness wear-resistant glass cover plate, and the invention sequentially coats films on the surface of the glass cover plate substrate by a magnetron sputtering method, so that the films are tightly combined together, and the friction resistance of the product is further improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the provided drawings without creative efforts.
FIG. 1 is a schematic structural diagram of a high-hardness wear-resistant glass cover plate according to the present invention.
Detailed Description
The invention provides a high-hardness wear-resistant glass cover plate which comprises a glass substrate and SiO which are sequentially contacted2A layer, a hydrogen-containing DLC layer, and a Si-doped DLC layer;
the atomic percentage of Si in the Si-doped DLC layer is 8-14%. In the present invention, the atomic percentage is the percentage of the number of atoms of Si atoms to the total number of atoms in the entire Si-DLC.
Referring to fig. 1, fig. 1 is a schematic structural diagram of a high-hardness wear-resistant glass cover plate according to the present invention, and the glass cover plate according to the present invention will be explained with reference to the structure in fig. 1.
In the present invention, the glass substrate is not particularly limited, and can be used as a glass cover plate in optical products such as mobile phones, wearable devices, vehicles and industrial products. The thickness of the glass substrate is not particularly limited, and a conventional glass cover plate thickness may be used, and may be, for example, 0.55, 0.7 or 1.1 mm.
In the present invention, the SiO2The main component of the layer is SiO2Containing a small amount of Si component of which SiO is2The content of (b) is preferably 60-98%, more preferably 70-90%; the SiO2The thickness of the layer is preferably 2 to 20nm, more preferably 5 to 15 nm. In the present invention, SiO2The layer has the function of improving the binding force of the hydrogen-containing DLC layer and the glass substrate and improving the overall scratch resistance of the product.
In the invention, the hydrogen-containing DLC layer mainly comprises a three-dimensional network formed by mixing SP3 hybridized carbon atoms with a diamond structure and SP2 hybridized carbon atoms with a graphite structure, and a part of C-H bond components, and is a metastable long-range disordered amorphous material. The thickness of the hydrogen-containing DLC layer is preferably 3 to 20nm, more preferably 5 to 15nm, and most preferably 10 to 12 nm. The hydrogen-containing DLC layer has high optical transmittance, high hardness, strong scratch resistance and good wear resistance, and can effectively improve the scratch resistance and the friction resistance of the film layer.
In the invention, the Si-doped DLC layer (Si-DLC layer) is formed by doping a certain content of Si in the hydrogen-containing DLC, and the atomic content of the Si is preferably 8-14%, more preferably 10-13%; the main chemical bonds of the layer are carbon-carbon single bonds, carbon-carbon double bonds, silicon-carbon bonds and carbon-hydrogen bonds. The thickness of the Si-doped DLC layer is preferably 3 to 20nm, more preferably 5 to 15nm, and most preferably 10 to 12 nm. The Si-DLC layer has the functions of improving the overall hardness and the scratch resistance of the film layer and reducing the dynamic friction coefficient of the film layer.
The invention also provides a preparation method of the high-hardness wear-resistant glass cover plate, which comprises the following steps:
A) si is taken as a target material, Ar gas and O are introduced2Carrying out magnetron sputtering on the glass substrate under the vacuum condition to obtain the SiO-plated glass substrate2A glass substrate of the layer;
B) graphite is used as a target material, Ar gas and H are introduced2Plating SiO under vacuum condition2Carrying out magnetron sputtering on the glass of the layer to obtain a glass substrate plated with a hydrogen-containing DLC layer;
C) si-graphite is taken as a composite target material, Ar gas and H are introduced2And carrying out magnetron sputtering on the glass substrate plated with the hydrogen-containing DLC layer under a vacuum condition to obtain the high-hardness wear-resistant glass cover plate.
The invention preferably removes dust and cleans oil on the glass substrate to obtain a clean coated surface.
Putting the cleaned glass into a cavity of a magnetron sputtering device, vacuumizing the cavity, wherein the vacuum degree is preferably 3.0-6.0E-6 mTorr, more preferably 4.0-5.0E-6 mTorr, then taking Si as a target material, and introducing Ar gas and O2Performing magnetron sputtering SiO plating2And (3) a membrane. The flow rate of Ar is preferably 35-100 sccm, more preferably 40-90 sccm, and most preferably 50-80 sccm; said O is2The flow rate of (A) is preferably 8 to 50sccm, more preferably 10 to 45sccm, and most preferably 20 to 30 sccm. The air pressure of the coating film is preferably 3.0-9.0 mTorr, more preferably 4.0-8.0 mTorr, and most preferably 5.0-6.5 mTorr; the voltage of the coating is preferably 300-460V, more preferably 320-450V, and most preferably 330-400V; the coating time is preferably 15-60 s, more preferably 20-50 s, and most preferably 30-40 s; the power of the Si target is preferably 1.0-6.0 kW, and more preferably 1.5-5.0 kW.
Then the SiO is plated2Transferring the sample of the film to another vacuum chamber, plating a hydrogen-containing DLC layer, vacuumizing to a vacuum degree of preferably 3.0-6.0E-6 mTorr, more preferably 4.0-5.0E-6 mTorr, introducing Ar gas and H gas to the vacuum chamber using graphite as a target2And performing magnetron sputtering plating of a hydrogen-containing DLC film. The flow rate of Ar is preferably 25-45 sccm, and more preferably 30-35 sccm; said H2The flow rate of (A) is preferably 10 to 30sccm, more preferably 12 to 25sccm, and most preferably 15 to 20 sccm. The above-mentionedThe air pressure of the coating film is preferably 3.0-6.0 mTorr, more preferably 3.5-5.5 mTorr, and most preferably 4.0-5.0 mTorr; the voltage of the coating film is preferably 600-800V, more preferably 680-780V, and most preferably 720-780V; the coating time is preferably 15-50 s, more preferably 15-45 s, and most preferably 15-30 s; the power of the C target is preferably 5.0-8.0 kW, and more preferably 6.0-8.0 kW.
Finally, depositing a Si-DLC layer in a vacuum chamber with Si-graphite as a composite sputtering target, firstly vacuumizing, wherein the vacuum degree is preferably 3.0-6.0E-6 mTorr, more preferably 4.0-5.0E-6 mTorr, then introducing Ar gas and H by taking the Si-graphite as the target2And carrying out magnetron sputtering plating of the Si-doped hydrogen-containing DLC film. The flow rate of Ar is preferably 25-45 sccm, and more preferably 30-35 sccm; said H2The flow rate of (A) is preferably 10 to 30sccm, more preferably 12 to 25sccm, and most preferably 15 to 20 sccm. The air pressure of the coating film is preferably 3.0-6.0 mTorr, more preferably 3.5-5.5 mTorr, and most preferably 3.5-4.0 mTorr; the voltage of the coating film is preferably 600-800V, more preferably 680-780V, and most preferably 720-780V; the coating time is preferably 15-50 s, more preferably 15-45 s, and most preferably 15-30 s; the power of the Si-graphite target is preferably 5.0-8.0 kW, and more preferably 6.5-7.0 kW.
The invention provides a high-hardness wear-resistant glass cover plate which comprises a glass substrate and SiO which are sequentially contacted2A layer, a hydrogen-containing DLC layer, and a Si-doped DLC layer; the atomic percentage of Si in the Si-doped DLC layer is 8-14%. The invention designs a novel double-layer diamond-like carbon film structure by combining the characteristics of hydrogen-containing diamond-like carbon, and improves the hardness and the friction resistance of the film and reduces the dynamic friction coefficient of the film by doping Si with proper content in the DLC layer under the condition of ensuring high optical transmittance.
The invention also provides a preparation method of the high-hardness wear-resistant glass cover plate, and the invention sequentially coats films on the surface of the glass cover plate substrate by a magnetron sputtering method, so that the films are tightly combined together, and the friction resistance of the product is further improved.
In order to further illustrate the present invention, the following detailed description will be made on a high-hardness wear-resistant glass cover plate and a method for manufacturing the same, which are provided in the present invention, with reference to the following examples, but should not be construed as limiting the scope of the present invention.
Example 1
And (3) removing dust and oil on the surface of the glass substrate to obtain a clean coated surface. Putting the substrate into a cavity of a magnetron sputtering device, vacuumizing to a vacuum degree of 3.0-6.0E-6 mTorr, introducing Ar with a flow of 40sccm and O into a Si target2The flow rate is 45sccm, the coating air pressure is 6.5mTorr, the silicon target power is 1500W, the coating voltage is about 320V, the coating time is 30s, and the SiO is prepared2The transition layer is 4-8 nm thick. Then the sample is transferred to another vacuum chamber to be plated with a hydrogen-containing DLC film layer, the vacuum degree is 3.0-6.0E-6 mTorr, the flow of Ar gas is 30sccm, H2The gas flow is 12sccm, the C target power is 6.0KW, the coating air pressure is 3.5mTorr, the coating voltage is 720V, the coating time is 30s, and the thickness is 5-10 nm. Then depositing Si-DLC in a vacuum chamber with the silicon-carbon composite target material as a sputtering target, wherein the vacuum degree is 3.0-6.0E-6 mTorr, the flow of Ar gas is 30sccm, H2The gas flow is 15sccm, the Si-C target power is 6.5KW, the coating air pressure is 3.5mTorr, the coating voltage is 680V, the coating time is 30s, and the thickness is 5-10 nm.
The invention tests the product performance according to the following method:
film hardness: and testing the hardness of the film layer by a Mohs hardness method, wherein the Mohs hardness is scribed on the surface of the film layer by a Mohs hardness pen, and the hardness is graded by using a hardness pen label which cannot scribe scratches on the surface of the film layer. The Mohs hardness is 10 grades, the higher the number is, the diamond hardness is 10 at the maximum, and the talc hardness is 1 at the minimum.
The scratch resistance is realized by utilizing steel balls to scratch a film layer to be detected, wherein the diameter of each steel ball is 3.18mm, the steel balls are in contact with the surface of the film layer in a point contact mode, the load is 7.5N, the friction is carried out in a circulating and reciprocating mode, 1 time of counting is carried out in a reciprocating motion period, and the number of times of friction of the undamaged film layer is counted.
Coefficient of dynamic friction: the dynamic friction coefficient tester is a dynamic friction coefficient adopting device. Horizontally fixing a sample on a testing instrument, flatly wrapping the bottom of a slide block weighing 200g with paraffin paper, placing the paraffin paper surface on a testing surface of the sample in contact with the slide block, moving the sample at a constant speed of 100mm/min, wherein the moving distance is 30mm, and the instrument automatically acquires friction force and friction coefficient data.
Finally, the Mohs hardness of the film layer is tested to be 7, the scratch resistance times are 240-280, and the dynamic friction coefficient is 0.06-0.08.
Example 2
And (3) removing dust and oil on the surface of the glass substrate to obtain a clean coated surface. Putting the substrate into a cavity of a magnetron sputtering device, vacuumizing to a vacuum degree of 3.0-6.0E-6 mTorr, introducing Ar with a flow of 40sccm and O into a Si target2The flow rate is 45sccm, the coating air pressure is 6.5mTorr, the silicon target power is 1500W, the coating voltage is about 320V, the coating time is 30s, and the SiO is prepared2The transition layer is 4-8 nm thick. Then the sample is transferred to another vacuum chamber to be plated with a hydrogen-containing DLC film layer, the vacuum degree is 3.0-6.0E-6 mTorr, the flow of Ar gas is 30sccm, H2The gas flow is 12sccm, the C target power is 8.0KW, the coating air pressure is 3.5mTorr, the coating voltage is 780V, the coating time is 30s, and the thickness is 8-15 nm. Then depositing Si-DLC in a vacuum chamber with the silicon-carbon composite target material as a sputtering target, wherein the vacuum degree is 3.0-6.0E-6 mTorr, the flow of Ar gas is 30sccm, H2The gas flow is 20sccm, the Si-C target power is 6.5KW, the coating pressure is 4.0mTorr, the coating voltage is 680V, the coating time is 30s, and the thickness is 7-15 nm.
Through tests, the Mohs hardness of the film layer is 7, the scratch resistance times are 300-320, and the dynamic friction coefficient is 0.03-0.06.
Example 3
And (3) removing dust and oil on the surface of the glass substrate to obtain a clean coated surface. Putting the substrate into a cavity of a magnetron sputtering device, vacuumizing to a vacuum degree of 3.0-6.0E-6 mTorr, introducing Ar with a flow of 40sccm and O into a Si target2The flow rate is 45sccm, the coating air pressure is 6.5mTorr, the silicon target power is 1500W, the coating voltage is about 320V, the coating time is 30s, and the SiO is prepared2The transition layer is 4-8 nm thick. Then the sample is transferred to another vacuum chamber to be plated with a hydrogen-containing DLC film layer, the vacuum degree is 3.0-6.0E-6 mTorr, the flow of Ar gas is 30sccm, H2The gas flow is 12sccm, C target workThe rate is 6.0KW, the coating pressure is 3.5mTorr, the coating voltage is 780V, the coating time is 15s, and the thickness is 2-6 nm. Then depositing Si-DLC in a vacuum chamber with the silicon-carbon composite target material as a sputtering target, wherein the vacuum degree is 3.0-6.0E-6 mTorr, the flow of Ar gas is 30sccm, H2The gas flow is 20sccm, the Si-C target power is 6.5KW, the coating pressure is 4.0mTorr, the coating voltage is 680V, the coating time is 15s, and the thickness is 2-6 nm.
Through tests, the Mohs hardness of the film layer is 6, the scratch resistance times are 200-240, and the dynamic friction coefficient is 0.04-0.07.
Comparative example 1
And (3) removing dust and oil on the surface of the glass substrate to obtain a clean coated surface. Putting the substrate into a cavity of a magnetron sputtering device, vacuumizing to a vacuum degree of 3.0-6.0E-6 mTorr, introducing Ar with a flow of 40sccm and O into a Si target2The flow is 6sccm, the coating pressure is 4.5mTorr, the silicon target power is 800W, the coating voltage is about 420V, the coating time is 15s, and the SiO is prepared2The transition layer is 4-10 nm thick. Then the sample is transferred to another vacuum chamber to be plated with a hydrogen-containing DLC film layer, the vacuum degree is 3.0-6.0E-6 mTorr, the flow of Ar gas is 30sccm, H2The gas flow is 12sccm, the C target power is 5.0KW, the coating air pressure is 3.5mTorr, the coating voltage is 650V, the coating time is 15s, and the thickness is 2-5 nm. Then depositing Si-DLC in a vacuum chamber with the silicon-carbon composite target material as a sputtering target, wherein the vacuum degree is 3.0-6.0E-6 mTorr, the flow of Ar gas is 30sccm, H2The gas flow is 8sccm, the Si-C target power is 5.0KW, the coating pressure is 3.5mTorr, the coating voltage is 720V, the coating time is 15s, and the thickness is 2-5 nm.
Through tests, the Mohs hardness of the film layer is 6, the scratch resistance times are 180-240 times, and the dynamic friction coefficient is 0.07-0.12.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.

Claims (1)

1. A preparation method of a high-hardness wear-resistant glass cover plate comprises the following steps:
removing dust and oil on the surface of the glass substrate to obtain a clean film coating surface; putting the substrate into a cavity of a magnetron sputtering device, and vacuumizing to a vacuum degree of 3.0-6.0E-6mTorr, Si target as target material, Ar flow of 40sccm and O2The flow rate is 45sccm, the coating air pressure is 6.5mTorr, the silicon target power is 1500W, the coating voltage is 320V, the coating time is 30s, and the SiO is prepared2A transition layer with a thickness of 4-8 nm;
then the sample is transferred to another vacuum chamber to be plated with a DLC film layer containing hydrogen, and the vacuum degree is 3.0-6.0E-6mTorr, Ar gas flow of 30sccm, H2The gas flow is 12sccm, the C target power is 8.0KW, the coating pressure is 3.5mTorr, the coating voltage is 780V, the coating time is 30s, and the thickness is 8-15 nm;
then depositing Si-DLC in a vacuum chamber with the silicon-carbon composite target material as a sputtering target with a vacuum degree of 3.0-6.0E- 6mTorr, Ar gas flow of 30sccm, H2The gas flow is 20sccm, the Si-C target power is 6.5KW, the coating pressure is 4.0mTorr, the coating voltage is 680V, the coating time is 30s, and the thickness is 7-15 nm.
CN201710963120.5A 2017-10-17 2017-10-17 High-hardness wear-resistant glass cover plate and preparation method thereof Active CN107746186B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710963120.5A CN107746186B (en) 2017-10-17 2017-10-17 High-hardness wear-resistant glass cover plate and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710963120.5A CN107746186B (en) 2017-10-17 2017-10-17 High-hardness wear-resistant glass cover plate and preparation method thereof

Publications (2)

Publication Number Publication Date
CN107746186A CN107746186A (en) 2018-03-02
CN107746186B true CN107746186B (en) 2021-02-05

Family

ID=61252959

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710963120.5A Active CN107746186B (en) 2017-10-17 2017-10-17 High-hardness wear-resistant glass cover plate and preparation method thereof

Country Status (1)

Country Link
CN (1) CN107746186B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108658473B (en) * 2018-05-31 2020-02-21 厦门大学 A cover glass and its preparation method and application
CN109811304A (en) * 2019-02-23 2019-05-28 冯欢心 A kind of light-transmissive film that high stability is wear-resisting and its application
CN111856626B (en) * 2020-07-22 2021-11-26 中国建筑材料科学研究总院有限公司 Silicon-doped germanium carbide film, optical film, and preparation method and application thereof
CN113502456A (en) * 2021-07-22 2021-10-15 法柯特科技（江苏）有限公司 Preparation process of silicon-boron-carbon sputtering target material

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6929349B2 (en) * 2003-10-14 2005-08-16 Lexmark International, Inc. Thin film ink jet printhead adhesion enhancement
CN1738716A (en) * 2002-12-30 2006-02-22 莱克斯马克国际公司 Heater chip with a layer of doped diamond-like carbon covered with a layer of holes
CN1828970A (en) * 2001-02-28 2006-09-06 株式会社半导体能源研究所 Method of manufacturing semiconductor device
CN101097867A (en) * 2001-07-16 2008-01-02 株式会社半导体能源研究所 Peeling method, semiconductor device, and manufacturing method therefor
US7445273B2 (en) * 2003-12-15 2008-11-04 Guardian Industries Corp. Scratch resistant coated glass article resistant fluoride-based etchant(s)
CN105204685A (en) * 2015-09-22 2015-12-30 何颜玲 Scratch-resisfant fingerprint resistance touch screen and preparation method
CN105937022A (en) * 2015-03-05 2016-09-14 馗鼎奈米科技股份有限公司 Method for producing diamond-like carbon film
CN106521493A (en) * 2016-10-27 2017-03-22 广州今泰科技股份有限公司 Diamond-like carbon film of gradient structure and preparation method thereof
CN106929800A (en) * 2017-04-24 2017-07-07 信利光电股份有限公司 A kind of diamond-like carbon composite film and preparation method thereof

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1828970A (en) * 2001-02-28 2006-09-06 株式会社半导体能源研究所 Method of manufacturing semiconductor device
CN101097867A (en) * 2001-07-16 2008-01-02 株式会社半导体能源研究所 Peeling method, semiconductor device, and manufacturing method therefor
CN1738716A (en) * 2002-12-30 2006-02-22 莱克斯马克国际公司 Heater chip with a layer of doped diamond-like carbon covered with a layer of holes
US6929349B2 (en) * 2003-10-14 2005-08-16 Lexmark International, Inc. Thin film ink jet printhead adhesion enhancement
US7445273B2 (en) * 2003-12-15 2008-11-04 Guardian Industries Corp. Scratch resistant coated glass article resistant fluoride-based etchant(s)
CN105937022A (en) * 2015-03-05 2016-09-14 馗鼎奈米科技股份有限公司 Method for producing diamond-like carbon film
CN105204685A (en) * 2015-09-22 2015-12-30 何颜玲 Scratch-resisfant fingerprint resistance touch screen and preparation method
CN106521493A (en) * 2016-10-27 2017-03-22 广州今泰科技股份有限公司 Diamond-like carbon film of gradient structure and preparation method thereof
CN106929800A (en) * 2017-04-24 2017-07-07 信利光电股份有限公司 A kind of diamond-like carbon composite film and preparation method thereof

Also Published As

Publication number Publication date
CN107746186A (en) 2018-03-02

Similar Documents

Publication Publication Date Title
CN107746186B (en) High-hardness wear-resistant glass cover plate and preparation method thereof
TWI616330B (en) Coating for glass with improved scratch/wear resistance and oleophobic properties
JP5842814B2 (en) Camera mount
WO2019129110A1 (en) Mobile terminal housing and mobile terminal
CN103232171B (en) Glass cover plate for touch screens and preparation method thereof
WO2007018974A3 (en) Broad band antireflection coating and method of making same
CN108754450A (en) A kind of low stress diamond-like multi-layer film and preparation method thereof
WO2008000841A3 (en) Optical article having a temperature-resistant anti-reflection coating with optimized thickness ratio of low index and high index layers
JP6607918B2 (en) Conductive laminate for touch panel
TW200604729A (en) Anti-reflective coating composition and coating film with excellent stain resistance
MX2009006432A (en) Coating composition and photochromic optical article.
US9840779B2 (en) Decorative, jet-black coating
CN107675138B (en) A kind of DLC film compound glass cover board and preparation method thereof
CN107502860B (en) High-hydrophobicity multi-element doped diamond-like carbon film and preparation method thereof
CN105441945B (en) A kind of nano coating of high rigidity low-friction coefficient and preparation method thereof
CN116219364A (en) Superhard anti-reflection composite film for display screen surface and plating method thereof
CN106637128A (en) Transparent diamond-like nanometer thin film on surfaces of gold and alloy of gold and preparation method for transparent diamond-like nanometer thin film
CN117050671A (en) Peep-proof wear-resistant mobile phone film and preparation method thereof
CN103374724A (en) Colored film and manufacturing method thereof
TW200925299A (en) Solar selective absorber film and manufacturing method of the same
CN211972140U (en) Wear-resistant AG + AR + AF glass
JP2004093437A (en) Cover glass for watch
CN221108856U (en) Easily clean resistant composite construction who scrapes
CN208201104U (en) A kind of superhard water proof anti-soil plated film
CN218728121U (en) Prevent fingerprint coating film structure

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant