CN113031141A - Method for processing blazed grating based on gravity field - Google Patents
Method for processing blazed grating based on gravity field Download PDFInfo
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- CN113031141A CN113031141A CN202110363795.2A CN202110363795A CN113031141A CN 113031141 A CN113031141 A CN 113031141A CN 202110363795 A CN202110363795 A CN 202110363795A CN 113031141 A CN113031141 A CN 113031141A
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- 238000000034 method Methods 0.000 title claims abstract description 29
- 230000005484 gravity Effects 0.000 title claims abstract description 11
- 239000003292 glue Substances 0.000 claims abstract description 78
- 239000007788 liquid Substances 0.000 claims abstract description 50
- 239000000758 substrate Substances 0.000 claims abstract description 43
- 239000007787 solid Substances 0.000 claims abstract description 27
- 238000005520 cutting process Methods 0.000 claims abstract description 14
- 238000007639 printing Methods 0.000 claims abstract description 6
- 238000005530 etching Methods 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 20
- 238000001259 photo etching Methods 0.000 claims description 9
- 238000010521 absorption reaction Methods 0.000 claims description 6
- 238000005286 illumination Methods 0.000 claims description 6
- 238000007747 plating Methods 0.000 claims description 5
- 230000003746 surface roughness Effects 0.000 claims description 4
- 229910000838 Al alloy Inorganic materials 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229920001486 SU-8 photoresist Polymers 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 238000004132 cross linking Methods 0.000 claims description 3
- 239000007888 film coating Substances 0.000 claims description 3
- 238000009501 film coating Methods 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 238000005289 physical deposition Methods 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 claims description 3
- 238000006116 polymerization reaction Methods 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 230000003068 static effect Effects 0.000 claims description 3
- 238000009736 wetting Methods 0.000 claims description 3
- 238000001459 lithography Methods 0.000 claims description 2
- 238000005266 casting Methods 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 238000003848 UV Light-Curing Methods 0.000 abstract 1
- 238000000206 photolithography Methods 0.000 abstract 1
- -1 positioning sidewall Substances 0.000 abstract 1
- 230000007547 defect Effects 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 238000005498 polishing Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
本发明提供了一种基于重力场加工闪耀光栅的方法，该方法分解为定位侧壁加工、胶液浇筑、倾斜紫外固化和镀膜4大步骤，包括平面基底、定位侧壁、液态紫外胶、固态紫外胶、紫外光源、反射膜层；其中平面基底作为基底支撑定位侧壁并盛装液态紫外胶，在平面基底表面通过光刻、刻蚀、切削、打印等方式精密加工定位侧壁。将平面基底倾斜特定角度并利用紫外光源对液态紫外胶进行固化使其成为固态紫外胶，最后在固态紫外胶表面镀制反射膜层。
The invention provides a method for processing a blazed grating based on a gravity field. The method is decomposed into four major steps: positioning sidewall processing, glue pouring, inclined UV curing and coating, including flat substrate, positioning sidewall, liquid UV glue, solid state Ultraviolet glue, ultraviolet light source, and reflective film layer; the flat base serves as the base to support the positioning side wall and holds the liquid ultraviolet glue, and the surface of the flat base is precisely processed and positioned by means of photolithography, etching, cutting, printing, etc. The flat substrate is inclined at a specific angle, and the liquid UV glue is cured by an ultraviolet light source to make it into a solid UV glue, and finally a reflective film layer is plated on the surface of the solid UV glue.
Description
Technical Field
The invention belongs to the field of micro-optical processing, and particularly relates to a method for processing blazed gratings based on a gravitational field.
Background
In the field of micro-optical machining, blazed gratings are generally manufactured by means of diamond cutting or direct writing lithography. Diamond cutting can only process on the surface of softer metal and other materials, and has the defects of insufficient processing precision, higher surface roughness, shorter service life of a cutting head and the like. The direct-write photoetching adopts laser beam variable dose gray level exposure to form a quasi-continuous surface-shaped micro-relief in a photoresist layer, and has the defects of low processing efficiency, high cost, limited material selection and the like.
Disclosure of Invention
In order to overcome the defects of the existing blazed grating processing technology, the invention provides a method for processing a blazed grating based on a gravitational field.
The technical scheme adopted by the invention for solving the technical problems is as follows:
the invention relates to a method for processing blazed grating based on gravity field, which is divided into 4 steps of positioning side wall processing, glue solution pouring, inclined ultraviolet curing and film coating, wherein the device utilized by the method comprises a plane substrate, a positioning side wall, liquid ultraviolet glue, solid ultraviolet glue, an ultraviolet light source and a reflecting film layer; the method comprises the following steps: the plane substrate is used as a substrate supporting and positioning side wall and contains liquid ultraviolet glue, and the positioning side wall is precisely processed on the surface of the plane substrate in the modes of photoetching, etching, cutting, printing and the like. The plane substrate is inclined at a specific angle, the liquid ultraviolet glue is solidified by using an ultraviolet light source to form solid ultraviolet glue, and finally, a reflecting film layer is plated on the surface of the solid ultraviolet glue.
The flatness of the plane substrate is better than 10 μm, and the material selection includes but is not limited to glass, quartz, aluminum alloy, stainless steel and the like. The surface of the planar substrate is required to be clean and have a low surface roughness RMS of less than 100 nm.
The positioning side wall is positioned on the surface of the plane substrate and is parallel to the grating direction, and the material selection can be the substrate material per se, and can also be polymers including but not limited to SU-8 photoresist. The positioning side wall has submicron positioning accuracy, the positioning side wall is processed by a photoetching or mechanical cutting mode, the period of the positioning side wall is consistent with the design period of the blazed grating, the ratio of the height to the period is determined by the blazed angle, and the width is as small as possible within the process allowable range. It should be noted that the two sides of the planar substrate surface perpendicular to the grating direction also have sidewalls of the same height to prevent the liquid uv glue from overflowing.
The liquid ultraviolet glue is contained in a closed area formed by the plane substrate and the positioning side wall in a pouring mode, the liquid level of the liquid ultraviolet glue is flush with the upper surface of the positioning side wall, and the liquid ultraviolet glue is made of materials including but not limited to NOA61 ultraviolet glue. The liquid ultraviolet glue is reasonably selected or modified according to the surface characteristics of the positioning side wall, so that the wetting angle of the liquid ultraviolet glue is close to 90 degrees.
The liquid ultraviolet glue overflows the redundant glue solution along the inclined direction under the action of gravity after the plane substrate is inclined, the surface of the glue solution is always kept horizontal, and the inclined angle is determined by a blazed angle. And the inclined tool clamp is reasonably selected, a vibration source is isolated, and the liquid level of the glue solution is kept static. The wavelength of the ultraviolet light source is consistent with the absorption wavelength of the liquid ultraviolet glue, the typical absorption wavelength is 365nm, the uniformity of the illumination intensity of the light source is better than 90 percent, and the energy density is not lower than 10mW/cm2。
The solid ultraviolet glue is formed by converting liquid ultraviolet glue, and molecular chains generate polymerization crosslinking reaction under ultraviolet illumination, and gradually change from liquid state to solid state. The liquid ultraviolet glue does not contain a solvent, and the volume and the surface shape of the liquid ultraviolet glue are not changed after the liquid ultraviolet glue is converted into the solid ultraviolet glue.
The reflecting film layer is formed by plating on the surface of the solid ultraviolet glue in a vacuum physical deposition mode, and the materials include, but are not limited to, gold, silver, aluminum, chromium, silicon and the like. The parameters of the reflecting film layer, such as material, thickness and the like, are determined by the design parameters of the blazed grating.
The method comprises the following working procedures: firstly, obtaining a planar substrate by means of mechanical polishing and the like, then processing a positioning side wall on the surface of the planar substrate by means of cutting, photoetching, printing and the like, then pouring liquid ultraviolet glue and obliquely carrying out ultraviolet curing, and finally plating a reflecting film layer on the surface of the solid ultraviolet glue.
Compared with the prior art, the invention has the advantages that:
(1) compared with diamond cutting, the invention can improve the smoothness of the processed surface, improve the processing precision of the micro-topography and overcome the problem of short service life of the cutting head.
(2) Compared with direct-write photoetching processing, the method has the advantages that the processing efficiency can be greatly improved, the processing precision of the micro-morphology is improved, and the processing cost is reduced.
Drawings
Fig. 1 is a schematic diagram of a method for processing a blazed grating based on a gravitational field, where fig. 1(a) is processing of a positioning side wall, fig. 1(b) is glue pouring, fig. 1(c) is oblique ultraviolet curing, and fig. 1(d) is coating.
The reference numbers in the figures mean: 1 is a plane substrate, 2 is a positioning side wall, 3-1 is liquid ultraviolet glue, 3-2 is solid ultraviolet glue, 4 is an ultraviolet light source, and 5 is a reflecting film layer.
Detailed Description
The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
Examples
The invention relates to a method for processing blazed grating based on gravity field, which can be divided into 4 steps of positioning side wall processing, glue solution pouring, inclined ultraviolet curing and film coating, and comprises a planar substrate 1, a positioning side wall 2, liquid ultraviolet glue 3-1, solid ultraviolet glue 3-2, an ultraviolet light source 4 and a reflecting film layer 5; the plane substrate 1 is used as a substrate supporting and positioning side wall 2 and contains liquid ultraviolet glue 3-1, and the positioning side wall 2 is precisely machined on the surface of the plane substrate 1 in the modes of photoetching, etching, cutting, printing and the like. The planar substrate 1 is inclined at a specific angle, the liquid ultraviolet glue 3-1 is solidified by the ultraviolet light source 4 to form solid ultraviolet glue 3-2, and finally, a reflecting film layer is plated on the surface of the solid ultraviolet glue 3-2.
The flatness of the planar substrate 1 is better than 10 μm, and the material selection includes but is not limited to glass, quartz, aluminum alloy, stainless steel and the like. The surface of the planar substrate 1 is required to be clean and have a low surface roughness RMS of less than 100 nm.
The positioning side wall 2 is positioned on the surface of the planar substrate 1 and is parallel to the grating direction, and the material selection can be the substrate material itself, and can also be a polymer including but not limited to SU-8 photoresist. The positioning side wall 2 has submicron positioning accuracy, is processed by photoetching or mechanical cutting, the period of the positioning side wall is consistent with the design period of the blazed grating, the ratio of the height to the period is determined by the blazed angle, and the width is as small as possible within the process allowable range. It should be noted that, the two sides of the surface of the planar substrate 1 perpendicular to the grating direction also have the same height sidewall for preventing the liquid ultraviolet glue 3-1 from overflowing.
The liquid ultraviolet glue 3-1 is contained in a closed area formed by the plane substrate 1 and the positioning side wall 2 in a pouring mode, the liquid level is flush with the upper surface of the positioning side wall 2, and the material selection includes but is not limited to NOA61 ultraviolet glue. The liquid ultraviolet glue 3-1 is reasonably selected or modified according to the surface characteristics of the positioning side wall 2 to enable the wetting angle to be close to 90 degrees.
The liquid ultraviolet glue 3-1 overflows the redundant glue solution in the inclined direction under the action of gravity after the plane substrate 1 is inclined, the surface of the glue solution is always kept horizontal, and the inclined angle is determined by a blazed angle. And the inclined tool clamp is reasonably selected, a vibration source is isolated, and the liquid level of the glue solution is kept static. The wavelength of the ultraviolet light source 4 is consistent with the absorption wavelength of the liquid ultraviolet glue 3-1, the typical absorption wavelength is 365nm, the uniformity of the illumination of the light source is better than 90 percent, and the energy density is not lower than 10mW/cm2。
The solid ultraviolet glue 3-2 is formed by converting liquid ultraviolet glue 3-1, and molecular chains generate polymerization crosslinking reaction under ultraviolet illumination, and gradually change from liquid state to solid state. The liquid ultraviolet glue 3-1 does not contain solvent, and the volume and the surface shape do not change after being converted into the solid ultraviolet glue 3-2.
The reflecting film layer 5 is formed by plating on the surface of the solid ultraviolet glue 3-2 in a vacuum physical deposition mode, and the materials include, but are not limited to, gold, silver, aluminum, chromium, silicon and the like. The parameters of the reflecting film layer 5, such as material and thickness, are determined by the design parameters of the blazed grating.
The working process of the invention is as follows:
firstly, obtaining a planar substrate 1 by means of mechanical polishing and the like, then processing a positioning side wall 2 on the surface of the planar substrate by means of cutting, photoetching, printing and the like, then pouring liquid ultraviolet glue 3-1, carrying out inclined ultraviolet curing under an ultraviolet light source 4, and finally plating a reflecting film layer 5 on the surface of the solid ultraviolet glue 3-2.
Although the embodiments of the present invention have been described above in order to facilitate the understanding of the present invention by those skilled in the art, it is to be understood that the present invention is not limited to the scope of the embodiments, and it will be apparent to those skilled in the art that various changes may be made without departing from the spirit and scope of the invention as defined and defined by the appended claims, and all matters produced by the invention using the inventive concept are to be protected.
Claims (7)
1. A method for processing blazed grating based on gravity field is characterized in that the method can be divided into 4 steps of positioning side wall processing, glue solution pouring, inclined ultraviolet curing and film coating, and a device utilized by the method comprises a plane substrate (1), a positioning side wall (2), liquid ultraviolet glue (3-1), solid ultraviolet glue (3-2), an ultraviolet light source (4) and a reflecting film layer (5); the method comprises the following steps: the plane substrate (1) is used as a substrate to support and position the side wall (2) and contain liquid ultraviolet glue (3-1), the side wall (2) is precisely processed and positioned on the surface of the plane substrate (1) in a photoetching, etching, cutting and/or printing mode, the plane substrate (1) is inclined at a specific angle, the liquid ultraviolet glue (3-1) is solidified by using an ultraviolet light source (4) to form the solid ultraviolet glue (3-2), and finally a reflecting film layer is plated on the surface of the solid ultraviolet glue (3-2).
2. A method for fabricating blazed grating based on gravity field according to claim 1, wherein the flatness of the planar substrate (1) is better than 10 μm, the material is selected from glass, quartz, aluminum alloy and stainless steel, and the surface of the planar substrate (1) is required to be clean and have low surface roughness RMS less than 100 nm.
3. The method for processing the blazed grating based on the gravitational field as claimed in claim 1, wherein the positioning sidewall (2) is located on the surface of the planar substrate (1) and parallel to the grating direction, the material can be the substrate material itself, or the polymer can include SU-8 photoresist, the positioning sidewall (2) has sub-micron positioning accuracy, the positioning sidewall is processed by lithography or mechanical cutting, the period of the positioning sidewall coincides with the design period of the blazed grating, the ratio of the height to the period is determined by the blazed angle, the width is as small as possible within the process tolerance range, and it is noted that the sidewall with the same height is respectively located on both sides of the surface of the planar substrate (1) perpendicular to the grating direction for preventing the liquid ultraviolet glue (3-1) from overflowing.
4. The method for processing the blazed grating based on the gravitational field as claimed in claim 1, wherein the liquid uv-glue (3-1) is contained in a closed area defined by the planar substrate (1) and the positioning side wall (2) by casting, the liquid level is flush with the upper surface of the positioning side wall (2), the material selection comprises NOA61 uv-glue, and the wetting angle of the liquid uv-glue (3-1) is reasonably selected or modified to be close to 90 ° according to the surface characteristics of the positioning side wall (2).
5. The method for processing the blazed grating based on the gravity field as claimed in claim 1, wherein the liquid ultraviolet glue (3-1) overflows the excessive glue solution in the inclined direction under the action of gravity after the plane substrate (1) is inclined, the surface of the glue solution is always kept horizontal, the inclined angle is determined by the blazed angle, an inclined tool fixture is reasonably selected, a vibration source is isolated, the liquid level of the glue solution is kept static, the wavelength of the ultraviolet light source (4) is consistent with the absorption wavelength of the liquid ultraviolet glue (3-1), the typical absorption wavelength is 365nm, the uniformity of the light source illumination is better than 90%, and the energy density is not lower than 10mW/cm2。
6. The method for processing the blazed grating based on the gravitational field as recited in claim 1, wherein the solid uv-gel (3-2) is converted from a liquid uv-gel (3-1), molecular chains undergo a polymerization crosslinking reaction under uv illumination, gradually change from a liquid state to a solid state, the liquid uv-gel (3-1) does not contain a solvent, and the volume and the surface shape do not change after being converted into the solid uv-gel (3-2).
7. The method for processing the blazed grating based on the gravitational field as claimed in claim 1, wherein the reflective film layer (5) is formed by plating on the surface of the solid ultraviolet glue (3-2) in a vacuum physical deposition manner, the material comprises gold, silver, aluminum, chromium, and silicon, and the parameters of the reflective film layer (5) such as the material and the thickness are determined by the design parameters of the blazed grating.
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| CN112572018A (en) * | 2019-09-29 | 2021-03-30 | 中钞特种防伪科技有限公司 | Multilayer optical anti-counterfeiting element and manufacturing method thereof |
| CN110787361A (en) * | 2019-10-30 | 2020-02-14 | 西北工业大学 | A hollow inclined metal microneedle array and its manufacturing method based on SU-8 mold |
| CN112109258A (en) * | 2020-09-04 | 2020-12-22 | 杭州俊为科技有限责任公司 | Film and preparation technology thereof |
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