GB2230136B - Method for manufacturing static induction type semiconductor device and semiconductor devices manufactured thereby - Google Patents
Method for manufacturing static induction type semiconductor device and semiconductor devices manufactured therebyInfo
- Publication number
- GB2230136B GB2230136B GB9005988A GB9005988A GB2230136B GB 2230136 B GB2230136 B GB 2230136B GB 9005988 A GB9005988 A GB 9005988A GB 9005988 A GB9005988 A GB 9005988A GB 2230136 B GB2230136 B GB 2230136B
- Authority
- GB
- United Kingdom
- Prior art keywords
- induction type
- devices manufactured
- static induction
- semiconductor device
- type semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004065 semiconductor Substances 0.000 title 2
- 230000006698 induction Effects 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 230000003068 static effect Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/012—Manufacture or treatment of static induction transistors [SIT], e.g. permeable base transistors [PBT]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
- H10D12/211—Gated diodes
- H10D12/212—Gated diodes having PN junction gates, e.g. field controlled diodes
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1076009A JP2757962B2 (en) | 1989-01-26 | 1989-03-28 | Manufacturing method of electrostatic induction semiconductor device |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9005988D0 GB9005988D0 (en) | 1990-05-09 |
GB2230136A GB2230136A (en) | 1990-10-10 |
GB2230136B true GB2230136B (en) | 1993-02-10 |
Family
ID=13592818
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9005988A Expired - Fee Related GB2230136B (en) | 1989-03-28 | 1990-03-16 | Method for manufacturing static induction type semiconductor device and semiconductor devices manufactured thereby |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE4009675C2 (en) |
FR (1) | FR2645348B1 (en) |
GB (1) | GB2230136B (en) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4041517A (en) * | 1974-09-04 | 1977-08-09 | Tokyo Shibaura Electric Co., Ltd. | Vertical type junction field effect semiconductor device |
US4326209A (en) * | 1977-04-13 | 1982-04-20 | Nippon Gakki Seizo Kabushiki Kaisha | Static induction transistor |
EP0064561A1 (en) * | 1980-11-21 | 1982-11-17 | Zaidan Hozin Handotai Kenkyu Shinkokai | Static induction thyristor |
US4403396A (en) * | 1981-12-24 | 1983-09-13 | Gte Laboratories Incorporated | Semiconductor device design and process |
US4566172A (en) * | 1984-02-24 | 1986-01-28 | Gte Laboratories Incorporated | Method of fabricating a static induction type recessed junction field effect transistor |
EP0194199A2 (en) * | 1985-02-28 | 1986-09-10 | Research Development Corporation of Japan | Double gate static induction thyristor and method for manufacturing the same |
EP0194946A2 (en) * | 1985-03-13 | 1986-09-17 | Research Development Corporation of Japan | Pressurized contact type double gate static induction thyristor |
US4713358A (en) * | 1986-05-02 | 1987-12-15 | Gte Laboratories Incorporated | Method of fabricating recessed gate static induction transistors |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4060821A (en) * | 1976-06-21 | 1977-11-29 | General Electric Co. | Field controlled thyristor with buried grid |
JPS5492180A (en) * | 1977-12-29 | 1979-07-21 | Seiko Instr & Electronics Ltd | Manufacture of semiconductor device |
JPS6046551B2 (en) * | 1978-08-07 | 1985-10-16 | 株式会社日立製作所 | Semiconductor switching device and its manufacturing method |
JPS6016753B2 (en) * | 1979-01-19 | 1985-04-27 | 株式会社日立製作所 | Semiconductor switching device and its control method |
JPS5671979A (en) * | 1979-11-19 | 1981-06-15 | Toshiba Corp | Static induction transistor and preparation method thereof |
US4571815A (en) * | 1981-11-23 | 1986-02-25 | General Electric Company | Method of making vertical channel field controlled device employing a recessed gate structure |
JPS58131771A (en) * | 1982-02-01 | 1983-08-05 | Hitachi Ltd | Electrostatic induction type semiconductor switching device |
JPS60955A (en) * | 1983-06-18 | 1985-01-07 | 泉株式会社 | Anti-contamination processing method of protective sheet-shaped article for construction work |
US4551909A (en) * | 1984-03-29 | 1985-11-12 | Gte Laboratories Incorporated | Method of fabricating junction field effect transistors |
EP0178387B1 (en) * | 1984-10-19 | 1992-10-07 | BBC Brown Boveri AG | Gate turn-off power semiconductor device |
IT1202313B (en) * | 1985-09-26 | 1989-02-02 | Sgs Microelettronica Spa | SEMICONDUCTOR POWER DEVICE, NORMALLY INTERDICTED FOR HIGH VOLTAGES AND WITH MODULATED RON |
JPS634680A (en) * | 1986-06-24 | 1988-01-09 | Matsushita Electric Works Ltd | Electrostatic induction type semiconductor device |
-
1990
- 1990-03-16 GB GB9005988A patent/GB2230136B/en not_active Expired - Fee Related
- 1990-03-26 DE DE4009675A patent/DE4009675C2/en not_active Expired - Fee Related
- 1990-03-27 FR FR9003885A patent/FR2645348B1/en not_active Expired - Fee Related
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4041517A (en) * | 1974-09-04 | 1977-08-09 | Tokyo Shibaura Electric Co., Ltd. | Vertical type junction field effect semiconductor device |
US4326209A (en) * | 1977-04-13 | 1982-04-20 | Nippon Gakki Seizo Kabushiki Kaisha | Static induction transistor |
EP0064561A1 (en) * | 1980-11-21 | 1982-11-17 | Zaidan Hozin Handotai Kenkyu Shinkokai | Static induction thyristor |
US4403396A (en) * | 1981-12-24 | 1983-09-13 | Gte Laboratories Incorporated | Semiconductor device design and process |
US4566172A (en) * | 1984-02-24 | 1986-01-28 | Gte Laboratories Incorporated | Method of fabricating a static induction type recessed junction field effect transistor |
EP0194199A2 (en) * | 1985-02-28 | 1986-09-10 | Research Development Corporation of Japan | Double gate static induction thyristor and method for manufacturing the same |
EP0194946A2 (en) * | 1985-03-13 | 1986-09-17 | Research Development Corporation of Japan | Pressurized contact type double gate static induction thyristor |
US4713358A (en) * | 1986-05-02 | 1987-12-15 | Gte Laboratories Incorporated | Method of fabricating recessed gate static induction transistors |
Also Published As
Publication number | Publication date |
---|---|
FR2645348A1 (en) | 1990-10-05 |
GB9005988D0 (en) | 1990-05-09 |
FR2645348B1 (en) | 1997-01-17 |
DE4009675A1 (en) | 1990-10-04 |
DE4009675C2 (en) | 1995-04-06 |
GB2230136A (en) | 1990-10-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
746 | Register noted 'licences of right' (sect. 46/1977) |
Effective date: 19990428 |
|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20030316 |