GB9700381D0 - Method and apparatus for providing a film on a substrate - Google Patents

Method and apparatus for providing a film on a substrate

Info

Publication number
GB9700381D0
GB9700381D0 GBGB9700381.8A GB9700381A GB9700381D0 GB 9700381 D0 GB9700381 D0 GB 9700381D0 GB 9700381 A GB9700381 A GB 9700381A GB 9700381 D0 GB9700381 D0 GB 9700381D0
Authority
GB
United Kingdom
Prior art keywords
substrate
film
providing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB9700381.8A
Other versions
GB2321063A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OXFORD PLASMA TECHNOLOGY Ltd
Original Assignee
OXFORD PLASMA TECHNOLOGY Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OXFORD PLASMA TECHNOLOGY Ltd filed Critical OXFORD PLASMA TECHNOLOGY Ltd
Priority to GB9700381A priority Critical patent/GB2321063A/en
Publication of GB9700381D0 publication Critical patent/GB9700381D0/en
Publication of GB2321063A publication Critical patent/GB2321063A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB9700381A 1997-01-08 1997-01-08 Reactive particle beam sputtering Withdrawn GB2321063A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB9700381A GB2321063A (en) 1997-01-08 1997-01-08 Reactive particle beam sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9700381A GB2321063A (en) 1997-01-08 1997-01-08 Reactive particle beam sputtering

Publications (2)

Publication Number Publication Date
GB9700381D0 true GB9700381D0 (en) 1997-02-26
GB2321063A GB2321063A (en) 1998-07-15

Family

ID=10805744

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9700381A Withdrawn GB2321063A (en) 1997-01-08 1997-01-08 Reactive particle beam sputtering

Country Status (1)

Country Link
GB (1) GB2321063A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9901093D0 (en) * 1999-01-20 1999-03-10 Marconi Electronic Syst Ltd Method of making coatings

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2129996B1 (en) * 1971-03-25 1975-01-17 Centre Nat Etd Spatiales
USRE32849E (en) * 1978-04-13 1989-01-31 Litton Systems, Inc. Method for fabricating multi-layer optical films
US4637869A (en) * 1984-09-04 1987-01-20 The Standard Oil Company Dual ion beam deposition of amorphous semiconductor films
US4673475A (en) * 1985-06-28 1987-06-16 The Standard Oil Company Dual ion beam deposition of dense films
US4793908A (en) * 1986-12-29 1988-12-27 Rockwell International Corporation Multiple ion source method and apparatus for fabricating multilayer optical films
EP0410627A1 (en) * 1989-07-27 1991-01-30 Kabushiki Kaisha Toshiba Oxide film with preferred crystal orientation, method of manufacturing the same, and magneto-optical recording medium
JP3048072B2 (en) * 1991-05-25 2000-06-05 ローム株式会社 Method and apparatus for forming oxide film
GB9225270D0 (en) * 1992-12-03 1993-01-27 Gec Ferranti Defence Syst Depositing different materials on a substrate
JP3157943B2 (en) * 1993-03-01 2001-04-23 株式会社リコー Method and apparatus for modifying surface of substrate
WO1995002709A2 (en) * 1993-07-15 1995-01-26 President And Fellows Of Harvard College EXTENDED NITRIDE MATERIAL COMPRISING β-C3N¿4?
EP0739001B1 (en) * 1995-04-17 2001-02-21 Read-Rite Corporation Deposition of insulating thin film by plurality of ion beams

Also Published As

Publication number Publication date
GB2321063A (en) 1998-07-15

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)