JPS6285855A - Formation of very small gold electrode - Google Patents

Abstract

PURPOSE:To reduce cost by subjecting both face sides of a substrate to photoresist coating, superposing image masks having patterns of electrodes thereon and subjecting the photoresists to exposing and developing, then successively depositing chromium and gold thereon by evaporation. CONSTITUTION:Both side faces of the glass substrate or the like is subjected to coating of the positive type or negative type photoresist respectively and after the photoresists are prebaked, for about 5-60min at about 70-100 deg.C, positive masks or negative masks having the patterns of the electrodes are superposed thereon and are subjected to contact exposure for about 10-120sec by a mask aligner. The photoresists are developed by using a developing soln. for the photoresist and after rinsing, the chromium and gold are successively deposited by evaporation on the cured resin parts. The vapor deposition is executed in both cases by a vapor deposition method, sputtering method, etc., and the thicknesses thereof are made about 500-1,000Angstrom of the chromium layer and about 1,000-3,000Angstrom of the gold layer. The very small gold electrodes are thus easily formed on both side faces of the glass substrate by which the cost is reduced.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method of forming a fine gold electrode. More specifically, the present invention relates to a method of forming fine gold electrodes on both sides of a substrate.

[Conventional technology]

Microgold electrodes are used as enzyme sensors, hydrogen peroxide sensors, etc. These sensors immobilize physiologically active substances such as enzymes and microorganisms on them, and are used in the chemical industry, food industry, medical field, etc. It can be used as a biosensor.

Conventional micro-gold electrodes are made by forming multiple patterns on the same plane of a substrate such as a glass substrate, and then dividing the patterns appropriately.1 For example, when making a sensor multifunctional, two Alternatively, it would be necessary to cut the four micro gold electrodes in a row, making it unavoidable that the cost would be higher due to the area of the glass substrate, etc.

[Problem that the invention seeks to solve]

The present inventors investigated a method for easily forming a large number of microgold electrodes on a substrate and making the sensor multifunctional. As a result, the inventors used photolithography technology to form microgold electrodes on both sides of the substrate. We have found that forming electrodes is an effective method.

[Means for solving problems]

Therefore, the present invention relates to a method for forming a fine gold electrode, and the fine gold electrode is formed by coating one side of a substrate with a photoresist, overlaying an image mask having an electrode pattern thereon, exposing it to light, and developing it. This is carried out by sequentially depositing chromium and gold to form an electrode, and then applying the series of steps described above to the opposite side of the substrate 9.

A glass substrate or the like is generally used as the substrate, and a minute gold electrode is first formed on the negative side of the substrate. In its formation, it is first coated with positive or negative type photoresist, and then coated with approximately 70 to 100%
After baking at 0°C for about 5 to 60 minutes, a positive or negative mask with an electrode pattern is placed thereon, and exposed for about 10 to 120 seconds using a mask aligner, followed by a developer solution for the photoresist used. After developing and washing with water.

In the positive type, chromium and gold are sequentially deposited on the hardened resin part.

The vapor deposition of chromium and gold can be performed by any method such as vapor deposition, sputtering, or ion-blating, and the thickness of the chromium layer is generally about 500 mm.
~1500 people, and the gold layer is held under conditions of about 1000-3000 people.

In this way, for example, one side of the base having dimensions of 2 m + m x 2 mm is further extended by 6 cm, and the width of the extended part is 100 μm.
It is possible to easily form fine gold electrodes that are located opposite each other with an interval of μm.

After that, use the used photoresist stripper to peel off the resist on the substrate other than the electrode formation area, and then perform the same operation on the back side of the substrate to remove the resist at a predetermined position 1 on the back side, for example. desired shape in a symmetrical position with respect to the plane,
For example, electrodes having similar shapes are formed.

〔Effect of the invention〕

According to the method of the present invention, it is possible to easily form fine gold electrodes on both sides of a glass substrate, etc., and this makes it possible to easily form fine gold electrodes on both sides of a glass substrate. gold electrodes can be formed, and costs can be reduced.

〔Example〕

Next, the present invention will be explained with reference to examples.

Example A glass substrate (Corning product Corning 7059, size 16 x
Using a spinner, apply a positive type resist (Tokyo Ohka Products 0FER-80) to the negative side of the 23 x 0.9 m+s
0, viscosity 25 cps) was applied at 3000 rpm for 30 seconds so that the resist film thickness was about 1.25 μm.

This resist-coated glass substrate was placed in a clean oven and baked at 80° C. for 30 minutes. Thereafter, using a mask, the film was closely exposed to ultraviolet rays for 1 minute using a mask aligner. This exposed glass substrate was processed into a QFE
After developing using R developer (Tokyo Ohka Products NMD-3), washing with water and drying.

This was applied to an electron beam evaporation device (Japan Vacuum Technology Exhibition EBN-6).
Chromium and gold were sequentially vapor-deposited under conditions where the pressure during vapor deposition was I x 10-' to 2 x 10-' Torr, respectively. In this way, electrodes having L-shaped faces facing each other were formed with film thicknesses of 1,200 chromium and 2,200 gold, respectively, as measured using Talystep 1 (manufactured by Tiller-Hobson).

After that, 0FER stripping solution (Tokyo Ohka Products Stripping Solution-10)
) or acetone to peel off the resist other than the electrode forming portion, and then the same operation was performed on the back side of the glass substrate to form electrodes of the same shape at symmetrical positions with respect to the surface.

Claims (1)

[Claims] 1. A photoresist coating is applied to one side of the substrate, and an image mask having an electrode pattern is placed thereon,
1. A method for forming a micro gold electrode, which comprises exposing and developing, sequentially depositing chromium and gold to form an electrode, and then applying the series of steps to the opposite side of the substrate. 2. The method for forming a micro gold electrode according to claim 1, wherein the substrate is a glass substrate.