TW246745B - - Google Patents
Info
- Publication number
- TW246745B TW246745B TW083103336A TW83103336A TW246745B TW 246745 B TW246745 B TW 246745B TW 083103336 A TW083103336 A TW 083103336A TW 83103336 A TW83103336 A TW 83103336A TW 246745 B TW246745 B TW 246745B
- Authority
- TW
- Taiwan
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/68—Floating-gate IGFETs
- H10D30/681—Floating-gate IGFETs having only two programming levels
- H10D30/684—Floating-gate IGFETs having only two programming levels programmed by hot carrier injection
- H10D30/685—Floating-gate IGFETs having only two programming levels programmed by hot carrier injection from the channel
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
- H10D64/311—Gate electrodes for field-effect devices
- H10D64/411—Gate electrodes for field-effect devices for FETs
- H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/047,134 US5343424A (en) | 1993-04-16 | 1993-04-16 | Split-gate flash EEPROM cell and array with low voltage erasure |
Publications (1)
Publication Number | Publication Date |
---|---|
TW246745B true TW246745B (zh) | 1995-05-01 |
Family
ID=21947246
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW083103336A TW246745B (zh) | 1993-04-16 | 1994-04-14 |
Country Status (4)
Country | Link |
---|---|
US (1) | US5343424A (zh) |
EP (1) | EP0620600A3 (zh) |
JP (1) | JPH0750350A (zh) |
TW (1) | TW246745B (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5397726A (en) * | 1992-02-04 | 1995-03-14 | National Semiconductor Corporation | Segment-erasable flash EPROM |
US5528651A (en) * | 1994-06-09 | 1996-06-18 | Elekta Instrument Ab | Positioning device and method for radiation treatment |
US5511036A (en) * | 1994-12-19 | 1996-04-23 | Hughes Aircraft Company | Flash EEPROM cell and array with bifurcated floating gates |
US5844271A (en) * | 1995-08-21 | 1998-12-01 | Cypress Semiconductor Corp. | Single layer polycrystalline silicon split-gate EEPROM cell having a buried control gate |
US6125060A (en) * | 1998-05-05 | 2000-09-26 | Chang; Ming-Bing | Flash EEPROM device employing polysilicon sidewall spacer as an erase gate |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4317272A (en) * | 1979-10-26 | 1982-03-02 | Texas Instruments Incorporated | High density, electrically erasable, floating gate memory cell |
US4783766A (en) * | 1986-05-30 | 1988-11-08 | Seeq Technology, Inc. | Block electrically erasable EEPROM |
US4998220A (en) * | 1988-05-03 | 1991-03-05 | Waferscale Integration, Inc. | EEPROM with improved erase structure |
US5168465A (en) * | 1988-06-08 | 1992-12-01 | Eliyahou Harari | Highly compact EPROM and flash EEPROM devices |
US4958321A (en) * | 1988-09-22 | 1990-09-18 | Advanced Micro Devices, Inc. | One transistor flash EPROM cell |
US5057886A (en) * | 1988-12-21 | 1991-10-15 | Texas Instruments Incorporated | Non-volatile memory with improved coupling between gates |
JPH03245575A (ja) * | 1990-02-22 | 1991-11-01 | Mitsubishi Electric Corp | 半導体記憶装置及びその製造方法 |
US5130769A (en) * | 1991-05-16 | 1992-07-14 | Motorola, Inc. | Nonvolatile memory cell |
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1993
- 1993-04-16 US US08/047,134 patent/US5343424A/en not_active Expired - Fee Related
-
1994
- 1994-04-14 EP EP94302670A patent/EP0620600A3/en not_active Withdrawn
- 1994-04-14 TW TW083103336A patent/TW246745B/zh active
- 1994-04-15 JP JP6077635A patent/JPH0750350A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP0620600A3 (en) | 1995-01-18 |
EP0620600A2 (en) | 1994-10-19 |
JPH0750350A (ja) | 1995-02-21 |
US5343424A (en) | 1994-08-30 |