CN1329749C - 感光性黑色组合物、使用该组合物的黑底基板和滤色器 - Google Patents

感光性黑色组合物、使用该组合物的黑底基板和滤色器 Download PDF

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Publication number: CN1329749C
Authority: CN; China
Prior art keywords: black; composition; black matrix; photosensitive; general formula
Prior art date: 2003-06-20
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

CNB2004100600327A

Other languages

English (en)

Chinese (zh)

Other versions

CN1573369A (zh

Inventor

佐佐木宽

山田和则

港浩一

糸井健

谷瑞仁

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Toppan Inc

Artience Co Ltd

Original Assignee

Toppan Printing Co Ltd

Toyo Ink Mfg Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-06-20

Filing date

2004-06-21

Publication date

2007-08-01

2004-06-21 Application filed by Toppan Printing Co Ltd, Toyo Ink Mfg Co Ltd filed Critical Toppan Printing Co Ltd

2005-02-02 Publication of CN1573369A publication Critical patent/CN1573369A/zh

2007-08-01 Application granted granted Critical

2007-08-01 Publication of CN1329749C publication Critical patent/CN1329749C/zh

2024-06-21 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

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230000003760 hair shine Effects 0.000 description 1
125000005843 halogen group Chemical group 0.000 description 1
RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical group [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
150000002460 imidazoles Chemical class 0.000 description 1
125000001841 imino group Chemical group [H]N=* 0.000 description 1
230000008676 import Effects 0.000 description 1
235000019239 indanthrene blue RS Nutrition 0.000 description 1
238000002347 injection Methods 0.000 description 1
239000007924 injection Substances 0.000 description 1
230000031700 light absorption Effects 0.000 description 1
239000004973 liquid crystal related substance Substances 0.000 description 1
VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 description 1
229910001507 metal halide Inorganic materials 0.000 description 1
150000005309 metal halides Chemical class 0.000 description 1
239000007769 metal material Substances 0.000 description 1
125000005395 methacrylic acid group Chemical class 0.000 description 1
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
229910052759 nickel Inorganic materials 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
238000001579 optical reflectometry Methods 0.000 description 1
239000001061 orange colorant Substances 0.000 description 1
150000007530 organic bases Chemical class 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
239000002245 particle Substances 0.000 description 1
238000000059 patterning Methods 0.000 description 1
DGBWPZSGHAXYGK-UHFFFAOYSA-N perinone Chemical group C12=NC3=CC=CC=C3N2C(=O)C2=CC=C3C4=C2C1=CC=C4C(=O)N1C2=CC=CC=C2N=C13 DGBWPZSGHAXYGK-UHFFFAOYSA-N 0.000 description 1
CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
125000005936 piperidyl group Chemical group 0.000 description 1
229960005235 piperonyl butoxide Drugs 0.000 description 1
125000003367 polycyclic group Chemical group 0.000 description 1
229920000647 polyepoxide Polymers 0.000 description 1
229920000728 polyester Polymers 0.000 description 1
229920000151 polyglycol Polymers 0.000 description 1
239000010695 polyglycol Substances 0.000 description 1
238000006116 polymerization reaction Methods 0.000 description 1
239000004814 polyurethane Substances 0.000 description 1
229920002635 polyurethane Polymers 0.000 description 1
QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
125000000719 pyrrolidinyl group Chemical group 0.000 description 1
230000009467 reduction Effects 0.000 description 1
238000005096 rolling process Methods 0.000 description 1
238000003892 spreading Methods 0.000 description 1
230000007480 spreading Effects 0.000 description 1
229920003002 synthetic resin Polymers 0.000 description 1
239000000057 synthetic resin Substances 0.000 description 1
125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
238000010998 test method Methods 0.000 description 1
238000012546 transfer Methods 0.000 description 1
238000010023 transfer printing Methods 0.000 description 1
229910052724 xenon Inorganic materials 0.000 description 1
FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/23—Photochromic filters
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Spectroscopy & Molecular Physics (AREA)
Optical Filters (AREA)
Materials For Photolithography (AREA)
Liquid Crystal (AREA)

CNB2004100600327A 2003-06-20 2004-06-21 感光性黑色组合物、使用该组合物的黑底基板和滤色器 Expired - Fee Related CN1329749C (zh)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP176274/2003		2003-06-20
JP2003176274A JP4601267B2 (ja)	2003-06-20	2003-06-20	感光性黒色組成物、それを用いたブラックマトリックス基板およびカラーフィルタ

Publications (2)

Publication Number	Publication Date
CN1573369A CN1573369A (zh)	2005-02-02
CN1329749C true CN1329749C (zh)	2007-08-01

Family

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Application Number	Title	Priority Date	Filing Date
CNB2004100600327A Expired - Fee Related CN1329749C (zh)	2003-06-20	2004-06-21	感光性黑色组合物、使用该组合物的黑底基板和滤色器

Country Status (4)

Country	Link
JP (1)	JP4601267B2 (ja)
KR (1)	KR101072425B1 (ja)
CN (1)	CN1329749C (ja)
TW (1)	TWI287694B (ja)

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JP5489386B2 (ja) *	2005-03-03	2014-05-14	富士フイルム株式会社	固体撮像素子の反射防止膜用光硬化性組成物、それを用いた固体撮像素子用反射防止膜、固体撮像素子用反射防止膜の製造方法、及び固体撮像素子
JP2006301101A (ja) *	2005-04-18	2006-11-02	Fujifilm Electronic Materials Co Ltd	遮光・反射防止積層膜及びその形成方法、並びにそれを有する固体撮像素子及びその製造方法
JP5151126B2 (ja) *	2005-11-30	2013-02-27	東洋インキＳｃホールディングス株式会社	黒色組成物及びそれを用いたカラーフィルタ
TWI332519B (en) *	2005-11-30	2010-11-01	Toyo Ink Mfg Co	Black composition and process for manufacturing the same
JP4848936B2 (ja) *	2006-01-27	2011-12-28	東洋インキＳｃホールディングス株式会社	感光性黒色組成物およびカラーフィルタ
JP5115046B2 (ja) *	2007-06-14	2013-01-09	東洋インキＳｃホールディングス株式会社	感光性黒色組成物およびカラーフィルタ
KR101032275B1 (ko) *	2007-11-08	2011-05-06	주식회사 엘지화학	착색 분산액, 감광성 수지조성물 및 블랙매트릭스
KR20110040766A (ko) *	2008-06-04	2011-04-20	도요 잉키 세이조 가부시끼가이샤	전지용 조성물
JP5991040B2 (ja) *	2012-06-22	2016-09-14	凸版印刷株式会社	黒色感光性樹脂組成物、ブラックマトリックス及びカラーフィルタ
KR101907220B1 (ko) *	2013-06-20	2018-10-11	동우 화인켐 주식회사	블랙 매트릭스용 감광성 수지 조성물, 이를 이용하여 제조된 블랙 매트릭스 및 이를 포함하는 표시 장치
JP6217404B2 (ja) *	2014-01-17	2017-10-25	東洋インキＳｃホールディングス株式会社	黒色組成物および黒色塗膜

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Also Published As

Publication number	Publication date
JP4601267B2 (ja)	2010-12-22
JP2005010604A (ja)	2005-01-13
CN1573369A (zh)	2005-02-02
TW200506521A (en)	2005-02-16
KR20040110101A (ko)	2004-12-29
TWI287694B (en)	2007-10-01
KR101072425B1 (ko)	2011-10-11

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2007-08-01	C14	Grant of patent or utility model
2007-08-01	GR01	Patent grant
2016-08-10	CF01	Termination of patent right due to non-payment of annual fee	Granted publication date: 20070801 Termination date: 20150621
2016-08-10	EXPY	Termination of patent right or utility model

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