FR2371706A1 - DRY PROCESSING IMAGE PRODUCER ELEMENT - Google Patents

DRY PROCESSING IMAGE PRODUCER ELEMENT

Info

Publication number
FR2371706A1
FR2371706A1 FR7711275A FR7711275A FR2371706A1 FR 2371706 A1 FR2371706 A1 FR 2371706A1 FR 7711275 A FR7711275 A FR 7711275A FR 7711275 A FR7711275 A FR 7711275A FR 2371706 A1 FR2371706 A1 FR 2371706A1
Authority
FR
France
Prior art keywords
processing image
dry processing
image producer
derivatives
producer element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7711275A
Other languages
French (fr)
Other versions
FR2371706B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Publication of FR2371706A1 publication Critical patent/FR2371706A1/en
Application granted granted Critical
Publication of FR2371706B1 publication Critical patent/FR2371706B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
    • H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)

Abstract

La présente invention est relative à un élément producteur d'images par voie sèche. Cet élément est caractérisé en ce qu'il comprend un substrat, une mince couche d'un métal, et une couche photosensible contenant un liant polymère et un photosensibilisateur à base de benzophénone, de dérivés quinoniques, de dérivés de diazonium ou de dérivés azido. Application à la production d'images.The present invention relates to an element producing images by the dry process. This element is characterized in that it comprises a substrate, a thin layer of a metal, and a photosensitive layer containing a polymer binder and a photosensitizer based on benzophenone, quinone derivatives, diazonium derivatives or azido derivatives. Application to the production of images.

FR7711275A 1976-04-14 1977-04-14 DRY PROCESSING IMAGE PRODUCER ELEMENT Granted FR2371706A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4208376A JPS52126220A (en) 1976-04-14 1976-04-14 Dry image forming material and method of forming image

Publications (2)

Publication Number Publication Date
FR2371706A1 true FR2371706A1 (en) 1978-06-16
FR2371706B1 FR2371706B1 (en) 1980-04-25

Family

ID=12626139

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7711275A Granted FR2371706A1 (en) 1976-04-14 1977-04-14 DRY PROCESSING IMAGE PRODUCER ELEMENT

Country Status (12)

Country Link
JP (1) JPS52126220A (en)
BE (1) BE853618A (en)
CA (1) CA1094377A (en)
CH (1) CH628160A5 (en)
DD (1) DD130507A5 (en)
DE (1) DE2716422C2 (en)
FR (1) FR2371706A1 (en)
GB (1) GB1563010A (en)
IT (1) IT1094789B (en)
NL (1) NL185425C (en)
SE (1) SE435214B (en)
SU (1) SU948301A3 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5479027A (en) * 1977-12-05 1979-06-23 Kimoto Kk Dry picture forming material
JPS54179986U (en) * 1978-06-07 1979-12-19
EP0042632A1 (en) * 1980-06-20 1981-12-30 Agfa-Gevaert N.V. Recording material and method for the production of metal images
JPS5858546A (en) * 1981-10-02 1983-04-07 Kimoto & Co Ltd Photosensitive mask material for photoengraving
JPS59198445A (en) * 1983-04-27 1984-11-10 Kimoto & Co Ltd Image forming material by stripping
JPS60238826A (en) * 1984-05-14 1985-11-27 Kimoto & Co Ltd Image forming material
JPS61243603A (en) * 1985-04-19 1986-10-29 岡村　一 Candle stand
DE69524589D1 (en) * 1995-08-08 2002-01-24 Agfa Gevaert Nv Process for forming metallic images
EP0762214A1 (en) * 1995-09-05 1997-03-12 Agfa-Gevaert N.V. Photosensitive element comprising an image forming layer and a photopolymerisable layer
JP2001284350A (en) * 2000-03-31 2001-10-12 Nitto Denko Corp Pattern-forming method and adhesive sheet for peeling off thin film
JP2009032912A (en) * 2007-07-27 2009-02-12 Sony Corp Method of manufacturing semiconductor device, and method of manufacturing organic light-emitting device
US10349525B2 (en) 2013-10-30 2019-07-09 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Substrate comprising an electrical circuit pattern, method and system for providing same

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2999016A (en) * 1955-03-24 1961-09-05 Keuffel & Esser Co Drawing material
BE623972A (en) * 1961-10-23
DE1447012B2 (en) * 1963-07-20 1972-12-21 Kalle Ag, 6202 Wiesbaden-Biebrich NEGATIVE WORKING, SENSITIZED COPPER-ALUMINUM BIMETAL PLATE
DE1572153B2 (en) * 1966-06-27 1971-07-22 E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) PHOTOPOLYMERIZABLE RECORDING MATERIAL
DE1597644C3 (en) * 1966-11-03 1973-09-20 Teeg Research Inc., Detroit, Mich. (V.St.A.) Process for the production of deer images
DE1671625A1 (en) * 1967-01-24 1971-09-16 Kalle Ag Composite material for the production of multi-metal printing forms
ZA711869B (en) * 1970-05-27 1971-12-29 Gen Electric Aqueous electrocoating solutions and method of making and using same
JPS4837643A (en) * 1971-09-15 1973-06-02
JPS5821257B2 (en) * 1974-04-25 1983-04-28 富士写真フイルム株式会社 Red-spotted moth
JPS516530A (en) * 1974-07-04 1976-01-20 Toray Industries GAZOKEISEIZ AIRYO

Also Published As

Publication number Publication date
AU1946676A (en) 1978-06-29
BE853618A (en) 1977-08-01
NL7704083A (en) 1977-10-18
FR2371706B1 (en) 1980-04-25
SU948301A3 (en) 1982-07-30
GB1563010A (en) 1980-03-19
DD130507A5 (en) 1978-04-05
JPS5613305B2 (en) 1981-03-27
DE2716422A1 (en) 1977-11-03
JPS52126220A (en) 1977-10-22
SE435214B (en) 1984-09-10
NL185425B (en) 1989-11-01
CA1094377A (en) 1981-01-27
IT1094789B (en) 1985-08-02
CH628160A5 (en) 1982-02-15
DE2716422C2 (en) 1987-10-01
NL185425C (en) 1990-04-02

Similar Documents

Publication Publication Date Title
FR2371706A1 (en) DRY PROCESSING IMAGE PRODUCER ELEMENT
IT1115626B (en) PROCESSING PROCESS FOR THE DEPOSIT OF THIN COPLANAR FILMS
BE853199A (en) PROCEDURE FOR FORMING A METAL OR METAL COMPOUND COATING ON A FACE OF A GLASS SUBSTRATE AND A DEVICE SUITABLE FOR FORMING SUCH COATING
FR2426281A1 (en) ELECTROPHOTOGRAPHIC PLATE
FR2394892A1 (en) MULTIPLE DEPOSIT BY MASKING PROCESS
JPS5479032A (en) Image formation emthod
FR2412406A1 (en) EASILY DECAPABLE PRINTED CIRCUIT PLATE AND ITS MANUFACTURING PROCESS
BE853200A (en) METHOD FOR FORMING A METAL OR METAL COMPOUND COATING ON A FACE OF A GLASS SUBSTRATE AND DEVICE SUITABLE TO BE USED TO FORM SUCH COATING
KR870010218A (en) Method of processing metal thin plate by photo etching method
JPS5232270A (en) Passivation film formaion by sputtering
DE69106675D1 (en) Thin-film conducting device and method for its production.
FR2365144A1 (en) PRINTING FILM AND PROCESS FOR ITS IMPLEMENTATION
FR2419535A1 (en) DISPERSAL IMAGE FORMATION MATERIAL AND METHOD FOR PRODUCING AN IMAGE
KR940006186A (en) Sputtering target, wiring method for electronic device and electronic device
JPS53117428A (en) Recording method for information signal
JPS5470791A (en) Thin plate piezoelectric oscillator
JPS5240968A (en) Process for production of semiconductor device
JPS51151130A (en) Micro photograph device
JPS5221768A (en) Producing system of semiconductor element
FR2415823A1 (en) PHOTORETICULABLE COMPOSITION CONTAINING A POLYMER WITH A CARBONYL GROUP, PHOTOSENSITIVE PRODUCT OBTAINED FROM THIS COMPOSITION AND IMAGE FORMATION PROCESS WHICH USES THIS PRODUCT
KR910008792A (en) Manufacturing method of double sided semiconductor device
JPS5218169A (en) Production method of semiconductor
JPS51126384A (en) A method of forming a thin film by sputtering
IT1060059B (en) PROCEDURE FOR THE PRODUCTION OF SENSITIZED SURFACES FOR THE DEPOSITION OF METAL WITHOUT ELECTRICITY AND PRODUCT SO OBTAINED
JPS53105385A (en) Manufacture for semiconductor

Legal Events

Date Code Title Description
ST Notification of lapse